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Process of PVD Film Formation

Ion Plating Methods have several methods such as arc discharge type, electron beam type, hollow cathode type. We introduce arc discharge type as a representative method of ion plating.

Arc discharge type forms a film by vaporizing side of metal targets and by piling up the film components with reactive gas at the same time. The objects are kept on a table which keeps rotating during the process.

Process of Film Formation

Introducing film forming process (ex. TiCN)

①
The objects are heated after vacuuming the inside of the chamber.
②
Applying negative voltage on the objects

③
Applying Nitrogen and hydrocarbon gas as reactive gas
④
Ionized metal is created by vaporizing metal target of Ti in the chamber.

⑤
The film is formed by receiving electron from the objects electrically charged as negative to metal and reactive gas electrically charged as positive.